We can provide high temperature superconducting thin film substrate , magnetic thin films and ferroelectric thin film substrate , semiconductor crystal , optical crystal , laser crystal materials ,at the same time provide orientation and foreign universities and research institutes to provide high quality ( ultra smooth ,ultra smooth , ultra clean)
In the field of research and production of microelectronics and optoelectronic materials and devices, silicon nitride has become an important thin film material. Transforming the development of ultra-large-scale integrated circuits, integration, complexity and packaging requirements continue to increase, silicon nitride research has found that the nitrogen in silicon can increase the strength of silicon single crystals, prevent silicon wafer warpage, and inhibit the formation of micro-defects .
Silicon Nitride Film (Si3N4 Film) on Silicon Wafer
| Diameter | 4 inch (100mm) |
| Si3N4 Film Layer Thickness | 100nm ; 200nm ; 300nm ,more thickness can be supplied |
| Layer process Method | LPCVD |
| Si wafer thicnkess | 375um / 500um / 200 um |
| Electrical Resistivity | <0.05Ω |
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size with tolerance (Diameter / Thickness /Si3N4 layer thickness )
2. Type ( N or P type )
3. Orientation
4. Electrical resistivity
5. Polishing Side (SSP or DSP )
6. Quantity
