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Sapphire Al2O3 Substrate

We can provide high temperature superconducting thin film substrate , magnetic thin films and ferroelectric thin film substrate , semiconductor crystal , optical crystal , laser crystal materials ,at the same time provide orientation and foreign universities and research institutes to provide high quality ( ultra smooth ,ultra smooth , ultra clean)

Al2O3 Substrate

Typical Physical Properties:

ProductSapphire Al2O3 
Crystal structurehexagonal 
Crystal lattice parametersa=4.758Å c=12.99Å 
Orientation<0001>,<11-20> <10-10>,<1-102> 
Melting point (°C) 2040
Density(g/cm3) 3.97
Mohs hardness9
Refractive index1.77
Coefficient of thermal expansion(×10-6/K)  7.5
Permittivity9.4@a 11.58@c 
Growth methodkyropoulos method, Czochralski method
Size(mm) Φ50.8×0.5mm; Φ100×0.65mm; 10×10×0.5mm ,maximum dia Φ180mm 
polishedOne side polished or both sides polished
Packing100 clean bag,1000 exactly clean bag

Sapphire Al2O3 Substrate

Please send us your request with below details to " sales@mdlmaterials.com" 

1. Size with tolerance  (Diameter / Thickness  )

2. Type 

3. Orientation 

4. Polishing Side (SSP or DSP )

5. Quantity


Product Name: Sapphire Al2O3 Substrate

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  • E-mail: sales@mdlmaterials.com
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