We supply various ceramic sputtering targets such as SiO，SiO2，TiO2,ZrO2，HfO2，TiOx，Ti3O5，Nb2O5，Ta2O5，Y2O3,NbF3，BaF2，CeF3，MgF2， LaF3,YF3，YbF3，ErF3 ,etc...
Ga2O3 Sputtering Target
Chemical formula：Ga2O3
Purity:99.99%
Melting point：1900℃
Density：5.32g/cm3
Storage and transportation conditions：Store in dry place, avoid damp, avoid high temperature
Shape :Disc,Rectangle
Currently our standard round target sizes range from 1" to 20" in diameter, and the rectangular targets are available in lengths up to and over 2000mm in single or multiple piece construction depending on the metal.
Please send us your request with below details to " sales@mdlmaterials.com"
1. Size /Tolerance ( or drawing )
2. Purity
3. Quantity
