Aluminum-Alloy Sputtering Target enhance the toughness and resistance to oxidation of the nitride coatings of drills, milling machines, indexable cutting inserts and other tool
| Item | Si-Al Rotatable Sputtering Target |
| Manufacturing Process | Plasma Sprayed |
| Specification | Length(max)4000mm*Thickness(max)13mm;Or as customers' requirements . |
| Relative Density | ≥96% |
| Purity | ≥99.95% |
| Grain Size | ≤100µm |
| Typical Products | Si-10Al(wt%) |
