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Chromium Sputtering targets

Name:Chromium Chemical formula:Cr Density: 7.14g/cm3

Chromium Sputtering Target

Manufacturing Process : Hot Isostatic Pressing

Chemical formula : Cr

Melting Point :  ℃

Density:7.14g.cm3

Specification : Max 4000mm,OD:<=300mm ; Or as customers' requirements .

Purity : 99.5% ; 99.7% ;99.8% ;99.9% ; 99.95% 

Grain Size <50um


The hard material coatings chromium (Cr) optimally protect engine components such as piston rings against premature wear and consequently extend the useful life of important engine parts. Chromium is used as a bonding layer for DLC coatings (Diamond Like Carbon), for example on bucket tappets. Furthermore, when used as a decorative coating, our chromium gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen.
Furthermore, when used as a decorative coating, our chromium gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen. 

Product NameChromium sputtering target
SymbolCr
Purity99.5%,99.8%,99.9%,99.95%
ShapePlanar target, Rotary Target,Arc Target
ProcessingHIP,Spray
ApplicationGlass Coating & DecorationTooling CoatingLab Research Semiconductors & Micro-Electronics


Cr Planar Target 


Chromium Sputtering targets


Cr Arc Target


Chromium Sputtering targets


Cr Rotary Target

Manufacturing Process SprayedHIP
Content Chromium Chromium
 Purity 99.5%~99.8% 99.5%~99.95%
 Relative Density >95.0% >99.0%
 Grain Size <100um <50um
TypeRotary  Rotary and Planar and Arc 
 Dimension Max Length 2000mm,Max Thickness 6mm OD≤300 Max Length 2000mm

Process Comparsion between Spray Cr rotary target and HIP Cr rotary Target


Spray Cr targetHIP Cr Target
Oxygen Content8000ppm80ppm
Relative Density≥95%≥98%
Purity99.599.5%~99.95%
Grain Size≤100um<50um
Uniformitya) larger difference at axial densityb) The uniformity of the target can’t be guaranteed a)High uniformity of the whole targetb)Density is close to the extrusion density of pure metal ,the rotary target has a uniform densityc)No loose zoned)No dark zonee)High uniformity at the sputtering material at top ,middle and bottom partf)High uniformity at the thickness and color of the PVD coating g)Nigh uniformity of the L、a、b at the top,middle and bottom part . 
PVD Current DensityCan’t reach long working hours at large currentLong working hours under high-power 

Chromium Sputtering targets

Product Name: Chromium Sputtering targets

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