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what is sputtering target ?

Jun 20 , 2018

A sputtering target is a material that is used to create thin films in a technique known as sputter deposition ,or thin film deposition. During this process the sputtering target material ,which begins as a solid ,is broken up by gaseous ions into tiny particles that form a spray and coat another material ,which is known as the substrate . Sputter deposition is commonly involved in the creation of semiconductors and computer chips . As a result ,most sputtering target materials are metallic elements or alloys , although there are some ceramic targets available that hardened thin coatings for various tools .

Depending on the nature of the thin film being created ,sputtering targets can very greatly in size and shape . The smallest targets can be less than one inch (2.5 cm) in diameter ,while the largest rectangular targets reach well over one yard (0.9 m ) in length . Some sputtering equipment will require a larger sputtering target and in these cases ,manufacturers will create segemented targets that are connected by special joints .

Jiangyin Maideli Advanced Materials can supply various sputterig targets for both industry and R&D markets . Contact info@mdlmaterials.com to know more details .

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